20 L Vacuümatmosfeer Box Furnace

20 L Vacuum Atmosphere Box Furnace LX113BF is a microprocessor controlled chamber with stable PID temperature control system. Equipped with a heating speed of 15 to 30 mins from RT to 1000 °C, the chamber adopts vacuum forming ceramic fiber with no power drops off with high temperature. Temperature uniformity with excellent protection of heating elements (MoSi2) is maintained. One press start button for pre-set programmes with alerting signal for overheating of chamber.

Used for fusing glass, soldering, brazing, creating enamel coatings, ceramics , research centers, medical laboratories to determine the non-volatile and non-combustible proportion of the sample and for highly sophisticated metallurgical applications

High temperature heating alloy wire for heating elements Heating speed - 15 to 30 mins from RT to 1000 °C PID controlled temperature controller with a precision of 1 °C One button press start for pre-programmed functions Durable inner lining of light insulating bricks Double walled housing for high stability Alert signal for overheating of chamber Double water cooling shelf with surface temperature ≤ 50 °C Heat curve can be preset with the programmable function 2 programmable groups with 16 segments

20 L Vacuum Atmosphere Box Furnace LX113BF